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阴极电弧制备TiAlN 薄膜工艺参数的正交分析研究
陈锋光 ; 孙丽丽 ; 成 浩 ; 柯培玲 ; 汪爱英
2011
Document Type期刊论文
Identifierhttp://ir.nimte.ac.cn/handle/174433/2783
Collection宁波所知识产出
Recommended Citation
GB/T 7714
陈锋光,孙丽丽,成 浩,等. 阴极电弧制备TiAlN 薄膜工艺参数的正交分析研究[J],2011.
APA 陈锋光,孙丽丽,成 浩,柯培玲,&汪爱英.(2011).阴极电弧制备TiAlN 薄膜工艺参数的正交分析研究..
MLA 陈锋光,et al."阴极电弧制备TiAlN 薄膜工艺参数的正交分析研究".(2011).
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