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Rapid crystallization of amorphous silicon films utilizing Ar-H-2 mesoplasma annealing 期刊论文
JOURNAL OF CRYSTAL GROWTH, 2018, 卷号: 486, 页码: 142-147
Authors:  Lu, Ziyu;  Zhang, Sheng;  Sheng, Jiang;  Gao, Pingqi;  Chen, Qixian;  Peng, Zhijian;  Wu, Sudong;  Ye, Jichun
Favorite  |  View/Download:15/0  |  Submit date:2018/12/04
Chemical-vapor-deposition  High-rate Epitaxy  Thermal-conductivity  Plasma-jet  Si Films  Pressure  Cvd  
Direct formation of wafer-scale single-layer graphene films on the rough surface substrate by PECVD 期刊论文
CARBON, 2018, 卷号: 129, 页码: 456-461
Authors:  Guo, Liangchao;  Zhang, Zhenyu;  Sun, Hongyan;  Dai, Dan;  Cui, Junfeng;  Li, Mingzheng;  Xu, Yang;  Xu, Mingsheng;  Du, Yuefeng;  Jiang, Nan;  Huang, Feng;  Lin, Cheng-Te
Favorite  |  View/Download:11/0  |  Submit date:2018/12/04
Chemical-vapor-deposition  High-quality  Raman-spectroscopy  Monolayer Graphene  Bilayer Graphene  Direct Growth  Carbon  Graphite  Copper  Cvd  
碳化硅衬底沉积高取向金刚石薄膜 期刊论文
硬质合金, 2017, 卷号: 34, 期号: 06, 页码: 407-412
Authors:  曹阳;  满卫东;  吕继磊;  刘伟;  孙洁;  江南
Favorite  |  View/Download:10/0  |  Submit date:2018/12/04
Dc-cvd  碳化硅  沉积参数  高取向  金刚石薄膜